Chemical Mechanical Wafer Polisher
CMP tool that chemically and mechanically polishes wafer surfaces to atomic flatness for device fabrication. The mechanical platen removes cermet material, classifying under HTS 8461.90.60 as other semiconductor processing machine tool.
Import Duty Rates by Country of Origin
| Origin Country | MFN Rate | Ch.99 Surcharges | Total Effective Rate |
|---|---|---|---|
| ๐จ๐ณChina | 4.4% | +35.0% | 39.4% |
| ๐ฒ๐ฝMexico | 4.4% | +10.0% | 14.4% |
| ๐จ๐ฆCanada | 4.4% | +10.0% | 14.4% |
| ๐ฉ๐ชGermany | 4.4% | +10.0% | 14.4% |
| ๐ฏ๐ตJapan | 4.4% | +10.0% | 14.4% |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If primarily chemical processing equipment
Centrifuges/reactors without mechanical removal classify as chemical plant machinery.
If for thermal-chemical wafer processing
Pure thermal semiconductor machines exclude mechanical polishing.
Not sure which classification is right?
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Import Tips & Compliance
โข Detail slurry and platen RPM specs to distinguish from pure chemical processors
โข Obtain advance classification ruling for hybrid CMP systems
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