Chemical Mechanical Wafer Polisher from Canada
CMP tool that chemically and mechanically polishes wafer surfaces to atomic flatness for device fabrication. The mechanical platen removes cermet material, classifying under HTS 8461.90.60 as other semiconductor processing machine tool.
Duty Rate — Canada → United States
14.4%
Rate breakdown
9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada
Import Tips
• Detail slurry and platen RPM specs to distinguish from pure chemical processors
• Obtain advance classification ruling for hybrid CMP systems