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Semiconductor Wafer Cleaner

Automated wet bench station that cleans wafers post-grinding/ lapping using megasonic, brush, and chemical processes to remove particles before fab entry. HTS 8445.90.00.00 as wafer preparation equipment.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
šŸ‡ØšŸ‡³China3.7%+20.0%23.7%
šŸ‡²šŸ‡½Mexico3.7%+10.0%13.7%
šŸ‡ØšŸ‡¦Canada3.7%+10.0%13.7%
šŸ‡©šŸ‡ŖGermanyFree+10.0%10%
šŸ‡ÆšŸ‡µJapanFree+12.5%12.5%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8421.29.00Higher: 40% vs 23.7%

If general industrial liquid filtering/ cleaning

Filtering/ purifying machinery by general application.

8486.20.00Higher: 25% vs 23.7%

If cleaning during device manufacturing

Post-prep device fab cleaning separate classification.

8479.82.00Higher: 37.5% vs 23.7%

If complete wafer mixing/ processing machines

Mixing/ kneading machines for slurries.

Not sure which classification is right?

The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.

Import Tips & Compliance

• Include particle removal specs (e.g

• <0.1μm) and chemical compatibility

• Distinguish from fab front-end cleaning (8486)

• Specify single wafer vs batch processing