Semiconductor Wafer Cleaner

Automated wet bench station that cleans wafers post-grinding/ lapping using megasonic, brush, and chemical processes to remove particles before fab entry. HTS 8445.90.00.00 as wafer preparation equipment.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China3.7%+17.5%21.2%
🇲🇽Mexico3.7%+10.0%13.7%
🇨🇦Canada3.7%+10.0%13.7%
🇩🇪Germany3.7%+10.0%13.7%
🇯🇵Japan3.7%+10.0%13.7%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8421.29.00Higher: 35% vs 21.2%

If general industrial liquid filtering/ cleaning

Filtering/ purifying machinery by general application.

8486.20.00Higher: 25% vs 21.2%

If cleaning during device manufacturing

Post-prep device fab cleaning separate classification.

8479.82.00Higher: 35% vs 21.2%

If complete wafer mixing/ processing machines

Mixing/ kneading machines for slurries.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Include particle removal specs (e.g

<0.1μm) and chemical compatibility

Distinguish from fab front-end cleaning (8486)

Specify single wafer vs batch processing