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Semiconductor Wafer Cleaner from Germany

Automated wet bench station that cleans wafers post-grinding/ lapping using megasonic, brush, and chemical processes to remove particles before fab entry. HTS 8445.90.00.00 as wafer preparation equipment.

Duty Rate — Germany → United States

10%

Rate breakdown

9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%

Import Tips

Include particle removal specs (e.g

<0.1μm) and chemical compatibility

Distinguish from fab front-end cleaning (8486)

Specify single wafer vs batch processing

Semiconductor Wafer Cleaner from Germany — Import Duty Rate | HTS 8445.90.00.00