Double-Sided Wafer Polisher

Chemical mechanical polishing (CMP) equipment that polishes both wafer surfaces simultaneously using polishing pads and slurry for mirror finish required in device fabrication. Classified HTS 8445.90.00.00 under statistical note for wafer polishers.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
šŸ‡ØšŸ‡³China3.7%+17.5%21.2%
šŸ‡²šŸ‡½Mexico3.7%+10.0%13.7%
šŸ‡ØšŸ‡¦Canada3.7%+10.0%13.7%
šŸ‡©šŸ‡ŖGermany3.7%+10.0%13.7%
šŸ‡ÆšŸ‡µJapan3.7%+10.0%13.7%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8486.20.00Higher: 25% vs 21.2%

If CMP used during device fabrication (post-prep)

Semiconductor device finishing machines classified separately.

8441.20.00Higher: 35% vs 21.2%

If precision polishing for optical components

Optical polishing distinct from semiconductor wafer prep.

8424.89.90Higher: 36.8% vs 21.2%

If mechanical surface finishing equipment

General projecting/ finishing machinery.

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Import Tips & Compliance

• Include polishing pad pressure and slurry flow specifications

• Classify as prep equipment only if pre-fab polishing confirmed