Chemical Mechanical Planarization Tool

CMP tools use chemical slurry and mechanical polishing pads to planarize wafers during device fabrication. While primarily fabrication equipment, preparatory CMP tools fall under HTS 8479.30.00.00 statistical notes for wafer preparation.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+35.0%35%
🇲🇽MexicoFree+10.0%10%
🇨🇦CanadaFree+10.0%10%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+10.0%10%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8424.89.90Higher: 36.8% vs 35%

If emphasizing mechanical polishing mechanism over chemical

General mechanical appliances for projecting/ dispersing liquids might apply.

8479.50.00Higher: 37.5% vs 35%

If for class 9021 testing equipment integration

Statistical notes direct some testing-integrated processing to Chapter 90.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Distinguish pre-fab CMP (8479.30) from device-fab CMP (other headings); provide process flow docs

Document slurry chemistry compatibility (e.g

ceria vs silica)

Ensure cleanroom compatibility certification