Wafer Polishing Head with Pad Holder
Carrier head with kinematic mounting for chemical mechanical planarization (CMP) pads used in final wafer polishing to angstrom-level flatness. For wafer polishers of heading 8430 semiconductor equipment. 8431.49.90 other parts.
Import Duty Rates by Country of Origin
| Origin Country | MFN Rate | Ch.99 Surcharges | Total Effective Rate |
|---|---|---|---|
| π¨π³China | Free | +35.0% | 35% |
| π²π½Mexico | Free | +10.0% | 10% |
| π¨π¦Canada | Free | +10.0% | 10% |
| π©πͺGermany | Free | +10.0% | 10% |
| π―π΅Japan | Free | +10.0% | 10% |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If functions as centrifugal apparatus
CMP heads with spinning/slurry functions may classify under centrifuge heading 8421.
If for other semiconductor fab equipment
Parts for unenumerated semiconductor machines often go to 8479.89 special provisions.
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Import Tips & Compliance
β’ Document CMP slurry compatibility and removal rate specs
β’ Common issue: classifying under 8421.19 as countertype centrifuges
β’ Requires cleanroom validation data
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