Wafer Lapping Plate for Semiconductor Polishers

Cast iron or copper lapping plate with colloidal slurry channels for flattening semiconductor wafers to nanometer tolerances before fabrication. Designed solely for wafer grinders, lappers, and polishers of heading 8430. Classifies as other parts in 8431.49.90.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
πŸ‡¨πŸ‡³ChinaFree+35.0%35%
πŸ‡²πŸ‡½MexicoFree+10.0%10%
πŸ‡¨πŸ‡¦CanadaFree+10.0%10%
πŸ‡©πŸ‡ͺGermanyFree+10.0%10%
πŸ‡―πŸ‡΅JapanFree+10.0%10%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

6804.10.00.00Same rate: 35%

If sold as general grinding/polishing pads

Millstones and grinding wheels of natural stone or agglomerated abrasives go to Chapter 68.

8424.89.90.00Higher: 36.8% vs 35%

If for mechanical polishing appliances

General polishing machinery parts may fall under 8424 if not semiconductor-specific.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

β€’ Document flatness achievement (<1 micron) and slurry compatibility

β€’ Pitfall: retail polishing pads classify under 6804

β€’ Requires cleanroom material certification (no contaminants)

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