Double-Sided Polished Boron-Doped Silicon Wafers

DSP prime silicon wafers p-type boron-doped, mirror polished both sides for MEMS and SOI processing. Standard electronic substrate in disc form. 3818.00.00 for polished doped wafers.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
πŸ‡¨πŸ‡³ChinaFree+50.0%50%
πŸ‡²πŸ‡½MexicoFreeβ€”Free
πŸ‡¨πŸ‡¦CanadaFreeβ€”Free
πŸ‡©πŸ‡ͺGermanyFreeβ€”Free
πŸ‡―πŸ‡΅JapanFreeβ€”Free

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

6804.21.00Lower: 35% vs 50%

If mechanical polishing emphasized

Millstones/abrasives if not electronic use.

8486.90.00Lower: 25% vs 50%

If SOI bonded wafers

Semiconductor manufacturing machines/parts.

3824.99.39Lower: 35% vs 50%

If polishing slurries

Chemical compounds for surface treatment.

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Import Tips & Compliance

β€’ Polish quality (DSP/SSP) affects value declaration

β€’ Class 1 cleanroom wafers need sealed transport

Related Products under HTS 3818.00.00

Arsenic-Doped Gallium Arsenide Wafers

Gallium arsenide substrates doped with arsenic for high-frequency RF and optoelectronic devices like LEDs. These compound semiconductors are in wafer/disc form for epitaxial growth. Doping qualifies them under HTS 3818.00.00 for electronics use.

Boron-Doped Diamond Wafers

CVD diamond discs heavily boron-doped (p++) for high-power electronics and quantum devices. Extreme semiconductor material in wafer form. HTS 3818.00.00 for doped electronic compounds.

Arsenic-Doped Indium Arsenide Wafers

InAs wafers doped for high-electron-mobility transistors in terahertz electronics. Compound semiconductor discs for advanced photonics. HTS 3818.00.00 applies.

Boron-Doped Silicon Wafers

Silicon wafers doped with boron to create p-type semiconductors, typically 300mm in diameter for semiconductor fabrication. These are chemical elements (silicon) intentionally doped for electronic applications in integrated circuit production. Classified under HTS 3818.00.00 due to their disc/wafer form and doping for electronics.

Phosphorus-Doped N-Type Silicon Wafers

High-purity silicon wafers doped with phosphorus for n-type conductivity, used in solar cells and CMOS manufacturing. The doping alters electrical properties specifically for electronic circuitry. HTS 3818.00.00 applies as doped chemical elements in wafer form.

Antimony-Doped Silicon Wafers

Silicon wafers with antimony doping for high-temperature n-type applications in power electronics. Provided in standard 200mm disc format for device fabrication. Falls under 3818.00.00 as doped chemical element for electronics.