For inspecting semiconductor wafers or devices (including integrated circuits) or for inspecting photomasks or reticles used in manufacturing semiconductor devices (including integrated circuits)
Measuring or checking instruments, appliances and machines, not specified or included elsewhere in this chapter; profile projectors; parts and accessories thereof: > Other optical instruments and appliances: > For inspecting semiconductor wafers or devices (including integrated circuits) or for inspecting photomasks or reticles used in manufacturing semiconductor devices (including integrated circuits)
Duty Rate (from China)
Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Subheadings
Products classified under HTS 9031.41.00
Applied Materials UVision 4E Patterned Wafer Inspector
High-resolution patterned wafer inspection tool using deep ultraviolet (DUV) optics to detect systematic and random defects on production wafers. Essential for yield enhancement in advanced semiconductor nodes below 10nm. Falls under HTS 9031.41.00 for semiconductor wafer inspection equipment.
KLA-Tencor Surfscan SP7 Unpatterned Wafer Scanner
Surface scanning system for bare silicon wafer defectivity mapping using multi-angle darkfield optics and UV laser excitation. Detects haze, flatness deviations, and particles down to 20nm. Specifically for semiconductor wafer inspection under HTS 9031.41.00.
Toray Engineering CIRCL-100 Photomask Inspector
Programmable spatial frequency response inspection system for binary and phase-shift photomasks using aerial image simulation technology. Ensures photomask CD uniformity and defect-free patterns for semiconductor production. HTS 9031.41.00 for reticle inspection.
Onto Innovation Firefly NDT Wafer Defect Review System
High-throughput noise defect termination system for patterned wafer review using broadband plasma illumination and programmable apertures. Automates defect classification for semiconductor process control. Classified under HTS 9031.41.00.
Camtek Eagle i 3D Wafer Metrology System
Advanced packaging 3D metrology tool combining optical profilometry and color interferometry for micro-bump inspection on semiconductor wafers. Critical for heterogeneous integration processes. HTS 9031.41.00 as wafer inspection equipment.
Lasertec M5650 EUV Blank Inspection System
Extreme ultraviolet (EUV) blank inspection system using actinic wavelength optics for multilayer defect detection on EUV photomasks. Essential for 3nm and below semiconductor nodes. Specifically HTS 9031.41.00 for photomask inspection.
Nova V-R series OCD Metrology Tool
Optical Critical Dimension (OCD) scatterometry system for semiconductor wafer film thickness and profile measurement using spectroscopic ellipsometry. Non-destructive process control for advanced nodes. HTS 9031.41.00 wafer inspection.
KLA-Tencor 8950E Patterned Wafer Inspector
High-volume production patterned wafer inspection system with simultaneous frontside/backside inspection capability using programmable illumination. Detects defects down to 40nm. Standard HTS 9031.41.00 classification.
BrightSpot Automation OWL Reticle Inspector
Programmable illumination reticle inspection system for photomask qualification using multiple wavelength sources and aerial image sensor technology. Used in semiconductor mask houses. HTS 9031.41.00 for reticle inspection.
KLA-Tencor 2935 Wafer Inspection System
Automated optical inspection system designed for detecting defects on unpatterned semiconductor wafers during manufacturing. It uses laser scanning and advanced imaging to inspect wafer surfaces for particles, scratches, and contamination at high speeds. Classified under HTS 9031.41.00 as it is specifically for inspecting semiconductor wafers.
Hitachi NSX Series Reticle Inspection System
Die-to-database reticle inspection system using transmitted and reflected light optics for photomask defect detection in semiconductor lithography. Critical for ensuring mask quality in leading-edge chip production. Classified in HTS 9031.41.00 for photomask/reticle inspection.
ASML YieldStar Optical Metrology Tool
Overlay and focus metrology system for semiconductor wafers using diffraction-based optical measurements to ensure lithographic pattern accuracy. Used post-exposure to monitor process control in high-volume manufacturing. HTS 9031.41.00 as wafer inspection equipment.
Nanotronics NVAid Automated Wafer Inspector
AI-powered wafer inspection platform combining brightfield, darkfield, and review SEM capabilities for comprehensive defect classification. Used in semiconductor fabs for process monitoring and yield analytics. HTS 9031.41.00 classification for wafer inspection.