For inspecting photomasks or reticles used in manufacturing semiconductor devices
Measuring or checking instruments, appliances and machines, not specified or included elsewhere in this chapter; profile projectors; parts and accessories thereof: > Other optical instruments and appliances: > For inspecting semiconductor wafers or devices (including integrated circuits) or for inspecting photomasks or reticles used in manufacturing semiconductor devices (including integrated circuits) > For inspecting photomasks or reticles used in manufacturing semiconductor devices
Duty Rate (from China)
Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Products classified under HTS 9031.41.00.20
CyberOptics SQ3000 Reticle Dimension Metrology Tool
Advanced 3D dimension metrology system using structured light for measuring photomask critical dimensions, sidewall angles, and overlay targets. Supports 5nm node requirements for mask qualification. Classified HTS 9031.41.0020 for reticle inspection in semiconductor manufacturing.
KLA-Tencor 29xx Series Reticle Inspection System
Advanced optical inspection system designed specifically for detecting defects on photomasks and reticles used in semiconductor photolithography. It employs laser scanning and AI-driven pattern recognition to identify particles, scratches, and pattern errors at nanometer scales. Classified under HTS 9031.41.0020 due to its dedicated function for photomask/reticle inspection in semiconductor manufacturing.
Applied Materials Verifier Summit Reticle Inspector
High-throughput reticle inspection platform using deep ultraviolet (DUV) illumination for detecting critical defects on advanced node photomasks. Features programmable defect classification and recipe-based inspection tailored for EUV and DUV lithography reticles. Falls under HTS 9031.41.0020 as a specialized optical appliance for semiconductor reticle quality control.
Lasertec MAGICS M-7360 Reticle Inspection Tool
Japanese-manufactured die-to-database reticle inspection system using proprietary MAGICS pattern matching for 10nm+ nodes. Detects systematic and random defects on binary and phase-shift masks with ultra-high sensitivity. HTS 9031.41.0020 classification applies to its exclusive photomask/reticle inspection capability in IC fabrication.
KLA-Tencor Teron 640e EUV Reticle Blank Inspector
Extreme ultraviolet (EUV) reticle blank inspection system for detecting buried defects in multilayer blanks before patterning. Uses actinic wavelength inspection critical for 7nm and below nodes. Specifically classified in HTS 9031.41.0020 for photomask/reticle inspection in semiconductor device manufacturing.
Camtek EagleR 3D Reticle Metrology System
3D optical metrology tool for measuring reticle surface topography, overlay marks, and critical dimensions on photomasks. Combines white light interferometry with pattern recognition for sub-1nm precision. HTS 9031.41.0020 due to specialized semiconductor reticle inspection function.
Nanophoton STARFYRE Reticle Defect Review Station
Near-field optical inspection station for high-resolution review of defects identified by automated reticle inspection tools. Provides sub-50nm defect imaging on photomasks for semiconductor production. Classified under HTS 9031.41.0020 for its photomask defect review specialization.
Zygo VeriFire XP8 Reticle Phase Measurement System
Laser Fizeau interferometer system for measuring phase errors and wavefront aberrations in phase-shift photomasks used for semiconductor lithography. Provides angstrom-level precision for optical proximity correction verification. HTS 9031.41.0020 classification for semiconductor reticle optical inspection.
Bruker ContourGT Reticle Surface Profiler
White light interferometric surface profiler optimized for measuring photomask blank surface roughness and topography critical for defect printability analysis. Sub-angstrom resolution meets semiconductor reticle specifications. Falls under HTS 9031.41.0020 for photomask inspection instrumentation.
Onto Innovation Firefly NPI Reticle Scanner
Programmable reticle scanner for new product introduction (NPI) phase, combining aerial image simulation with defect inspection for photomask qualification. Critical for qualifying masks before high-volume manufacturing. HTS 9031.41.0020 for semiconductor photomask inspection.