Lasertec MAGICS M-7360 Reticle Inspection Tool
Japanese-manufactured die-to-database reticle inspection system using proprietary MAGICS pattern matching for 10nm+ nodes. Detects systematic and random defects on binary and phase-shift masks with ultra-high sensitivity. HTS 9031.41.0020 classification applies to its exclusive photomask/reticle inspection capability in IC fabrication.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If configured for wafer as well as reticle inspection
Statistical reporting distinguishes wafer vs. reticle semiconductor inspection instruments.
If for general liquid crystal display (LCD) mask inspection
Other optical inspection devices, potentially covering flat panel display photomasks.
If primarily electrical test equipment for semiconductor devices
Other electrical machines for electrical quantities measurement in semiconductors.
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Import Tips & Compliance
• Include Japanese export certificates and technical datasheets specifying reticle-only functionality
• Prepare for extended customs review due to precision optics; have service contracts ready
• Label components separately if imported in subassemblies to optimize duty rates
Related Products under HTS 9031.41.00.20
CyberOptics SQ3000 Reticle Dimension Metrology Tool
Advanced 3D dimension metrology system using structured light for measuring photomask critical dimensions, sidewall angles, and overlay targets. Supports 5nm node requirements for mask qualification. Classified HTS 9031.41.0020 for reticle inspection in semiconductor manufacturing.
KLA-Tencor 29xx Series Reticle Inspection System
Advanced optical inspection system designed specifically for detecting defects on photomasks and reticles used in semiconductor photolithography. It employs laser scanning and AI-driven pattern recognition to identify particles, scratches, and pattern errors at nanometer scales. Classified under HTS 9031.41.0020 due to its dedicated function for photomask/reticle inspection in semiconductor manufacturing.
Applied Materials Verifier Summit Reticle Inspector
High-throughput reticle inspection platform using deep ultraviolet (DUV) illumination for detecting critical defects on advanced node photomasks. Features programmable defect classification and recipe-based inspection tailored for EUV and DUV lithography reticles. Falls under HTS 9031.41.0020 as a specialized optical appliance for semiconductor reticle quality control.
KLA-Tencor Teron 640e EUV Reticle Blank Inspector
Extreme ultraviolet (EUV) reticle blank inspection system for detecting buried defects in multilayer blanks before patterning. Uses actinic wavelength inspection critical for 7nm and below nodes. Specifically classified in HTS 9031.41.0020 for photomask/reticle inspection in semiconductor device manufacturing.
Camtek EagleR 3D Reticle Metrology System
3D optical metrology tool for measuring reticle surface topography, overlay marks, and critical dimensions on photomasks. Combines white light interferometry with pattern recognition for sub-1nm precision. HTS 9031.41.0020 due to specialized semiconductor reticle inspection function.
Nanophoton STARFYRE Reticle Defect Review Station
Near-field optical inspection station for high-resolution review of defects identified by automated reticle inspection tools. Provides sub-50nm defect imaging on photomasks for semiconductor production. Classified under HTS 9031.41.0020 for its photomask defect review specialization.