Polisher Head Pressure Bladder
Replaceable elastomeric bladder for chemical mechanical polishing (CMP) heads that provides uniform pressure distribution across entire wafer surface. Achieves <1% non-uniformity. Part of 8479.89.10 wafer polishers under 8479.90.41.00.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If general rubber articles
Rubber products classifiable by material regardless of semiconductor application
If plastic construction
Plastic articles without machine specificity go to Chapter 39
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Import Tips & Compliance
• Document material compatibility (perfluoroelastomer for CMP chemicals),Specify pressure range (1-6 PSI) and wafer size (200/300mm),Not rubber articles under Chapter 40
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