Polisher Head Pressure Bladder from Mexico
Replaceable elastomeric bladder for chemical mechanical polishing (CMP) heads that provides uniform pressure distribution across entire wafer surface. Achieves <1% non-uniformity. Part of 8479.89.10 wafer polishers under 8479.90.41.00.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Document material compatibility (perfluoroelastomer for CMP chemicals),Specify pressure range (1-6 PSI) and wafer size (200/300mm),Not rubber articles under Chapter 40