Polisher Head Pressure Bladder from China
Replaceable elastomeric bladder for chemical mechanical polishing (CMP) heads that provides uniform pressure distribution across entire wafer surface. Achieves <1% non-uniformity. Part of 8479.89.10 wafer polishers under 8479.90.41.00.
Duty Rate — China → United States
20%
Rate breakdown
9903.88.157.5%Except as provided in headings 9903.88.39, 9903.88.42, 9903.88.44, 9903.88.47, 9903.88.49, 9903.88.51, 9903.88.53, 9903.88.55, 9903.88.57, 9903.88.65, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(r) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(s)
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Document material compatibility (perfluoroelastomer for CMP chemicals),Specify pressure range (1-6 PSI) and wafer size (200/300mm),Not rubber articles under Chapter 40