Polisher Head Pressure Bladder from Japan
Replaceable elastomeric bladder for chemical mechanical polishing (CMP) heads that provides uniform pressure distribution across entire wafer surface. Achieves <1% non-uniformity. Part of 8479.89.10 wafer polishers under 8479.90.41.00.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Document material compatibility (perfluoroelastomer for CMP chemicals),Specify pressure range (1-6 PSI) and wafer size (200/300mm),Not rubber articles under Chapter 40