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Chemical Mechanical Wafer Polisher

CMP tool that simultaneously polishes and chemically etches semiconductor wafers to atomic-level flatness for device fabrication. Falls under HTS 8471.90.00.00 as semiconductor wafer preparation equipment.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
šŸ‡ØšŸ‡³ChinaFree+50.0%50%
šŸ‡²šŸ‡½MexicoFree+25.0%25%
šŸ‡ØšŸ‡¦CanadaFree+25.0%25%
šŸ‡©šŸ‡ŖGermanyFree+15.0%15%
šŸ‡ÆšŸ‡µJapanFree+15.0%15%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8421.19.00.00Lower: 38.8% vs 50%

If predominantly chemical etching apparatus

Primarily chemical processing equipment falls under filtering/centrifugal machines.

8479.82.00Lower: 37.5% vs 50%

If for continuous chemical processing lines

Integrated continuous-flow chemical plants have separate provisions.

Not sure which classification is right?

The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.

Import Tips & Compliance

• Specify polishing pad materials, slurry delivery systems, and endpoint detection

• Provide cleanroom certification and vibration isolation specifications