Engis Hyprez CNC Lapping System

Numerically controlled lapping system with diamond abrasive technology for finishing semiconductor wafers and precision metal components to sub-micron tolerances. Features programmable lapping cycles and in-situ measurement. HTS 8460.40.40.60 as numerically controlled lapping machine.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China4.4%+35.0%39.4%
🇲🇽Mexico4.4%+10.0%14.4%
🇨🇦Canada4.4%+10.0%14.4%
🇩🇪Germany4.4%+10.0%14.4%
🇯🇵Japan4.4%+10.0%14.4%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8486.40.00Lower: 25% vs 39.4%

If dedicated silicon wafer lapping

Semiconductor manufacturing equipment statistical note applies

8460.40Same rate: 39.4%

If horizontal spindle configuration

Spindle orientation affects specific machine tool subheadings

9031.49Lower: 10% vs 39.4%

If with integrated flatness measuring capability

Machines with significant measuring function classify as measuring equipment

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Specify diamond abrasive compatibility in technical specs; Include semiconductor wafer processing examples cautiously; Ensure proper declaration of numerical control features and software

Related Products under HTS 8460.40.40.60

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Numerically controlled lapping machine designed for precision finishing of flat metal surfaces and semiconductor wafers using abrasive slurries. Classified under HTS 8460.40.40.60 as a numerically controlled honing or lapping machine for metal or cermets, other than gear finishing types. Used in semiconductor manufacturing for wafer preparation to achieve critical flatness tolerances.

Okamoto CNC Double-Sided Lapping Machine DLS-1200

Numerically controlled double-sided lapping system for simultaneous finishing of both wafer surfaces to nanometer flatness. Specifically used in semiconductor wafer preparation after slicing to meet strict dimensional tolerances. Falls under HTS 8460.40.40.60 as other numerically controlled lapping machines for metal surfaces.

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Compact numerically controlled lapping machine for metallographic sample preparation and small semiconductor wafer finishing. Provides automated control of lapping parameters for consistent surface flatness. Classified in HTS 8460.40.40.60 as other numerically controlled lapping machines.

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