Wafer Polishing Head Vacuum Chuck
Porous ceramic vacuum chuck that mounts on polishing heads of wafer polishers (8429) to hold semiconductor wafers flat during final CMP preparation for device fabrication. Critical for nanometer flatness. 8431.49.9020.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If refractory ceramic ware not specifically porous for vacuum
General ceramic products by material composition.
If integral part of vacuum pump assembly
Vacuum pump parts fall under heading 8414.
If for general precision grinding machines
Non-semiconductor chucks go to 8466 parts.
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Import Tips & Compliance
• Specify porosity (10-40%), vacuum level, and wafer size compatibility
• Provide SEM photos of porous structure for material verification
• Solid chucks without vacuum classify differently under 6909
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