Silicon Epitaxy Gas Injector

Precision jet injector projecting precursor gases onto heated wafers for epitaxial layer growth in semiconductor devices. HTS 8424.89.9000 includes gas dispersing jet projecting machines for semiconductor processing.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China1.8%+35.0%36.8%
🇲🇽Mexico1.8%+10.0%11.8%
🇨🇦Canada1.8%+10.0%11.8%
🇩🇪Germany1.8%+10.0%11.8%
🇯🇵Japan1.8%+10.0%11.8%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8419.89.95Higher: 39.2% vs 36.8%

If industrial furnace parts for deposition

Epitaxial reactor chambers classify as heat treatment furnaces.

8479.81.00.00Lower: 35% vs 36.8%

If mixing/kneading apparatus for semiconductors

Gas mixing manifolds for deposition go to specific 8479 provisions.

8481.80.90Higher: 37% vs 36.8%

If valve regulator assemblies

Gas control valves separate from jet projecting function classify in 8481.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

• Provide gas flow uniformity and precursor compatibility documentation

• Classify showerhead separately from reactor chamber if modular

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