Silicon Epitaxy Gas Injector
Precision jet injector projecting precursor gases onto heated wafers for epitaxial layer growth in semiconductor devices. HTS 8424.89.9000 includes gas dispersing jet projecting machines for semiconductor processing.
Import Duty Rates by Country of Origin
| Origin Country | MFN Rate | Ch.99 Surcharges | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | +40.0% | 40% |
| 🇲🇽Mexico | Free | +15.0% | 15% |
| 🇨🇦Canada | Free | +15.0% | 15% |
| 🇩🇪Germany | Free | +15.0% | 15% |
| 🇯🇵Japan | Free | +15.0% | 15% |
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If industrial furnace parts for deposition
Epitaxial reactor chambers classify as heat treatment furnaces.
If mixing/kneading apparatus for semiconductors
Gas mixing manifolds for deposition go to specific 8479 provisions.
If valve regulator assemblies
Gas control valves separate from jet projecting function classify in 8481.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Provide gas flow uniformity and precursor compatibility documentation
• Classify showerhead separately from reactor chamber if modular
Related Products under HTS 8424.89.90.00
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