Other
Machinery, plant or laboratory equipment, whether or not electrically heated (excluding furnaces, ovens and other equipment of heading 8514), for the treatment of materials by a process involving a change of temperature such as heating, cooking, roasting, distilling, rectifying, sterilizing, pasteurizing, steaming, drying, evaporating, vaporizing, condensing or cooling, other than machinery or plant of a kind used for domestic purposes; instantaneous or storage water heaters, nonelectric; parts thereof: > Other machinery, plant or equipment: > Other: > Other: > Other
Duty Rate (from China)
Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
Subheadings
Products classified under HTS 8419.89.95
Czochralski Crystal Puller
A Czochralski crystal puller is specialized machinery used to grow monocrystalline silicon boules by melting polycrystalline silicon and slowly pulling a seed crystal to form ingots for semiconductor wafer production. It involves precise temperature control for melting and crystallization processes. Classified under HTS 8419.89.95 as equipment for temperature-based material treatment in semiconductor manufacturing.
Float Zone Crystal Grower
Float zone crystal growers use radio frequency heating to melt a narrow zone of polycrystalline silicon rod, allowing impurities to be zoned out while forming high-purity monocrystalline silicon for wafers. The process relies on localized heating and cooling for zone refining. Fits HTS 8419.89.95 for its temperature change processes in semiconductor material preparation.
Crystal Boule Grinder
Crystal boule grinders precisely grind semiconductor crystal ingots to exact diameters and cut flats indicating conductivity type, using controlled cooling during abrasive processes to prevent thermal damage. Essential for wafer preparation in semiconductor fabs. Classified in HTS 8419.89.95 due to integrated temperature management in material treatment.
Wafer Slicing Diamond Saw
Wafer slicing diamond saws cut ultra-thin slices from monocrystalline semiconductor boules using coolant systems with precise temperature regulation to maintain crystal integrity during high-speed cutting. Critical step in wafer manufacturing per statistical note. Falls under HTS 8419.89.95 for its cooling-involved material processing.
Wafer Polishing Machine
Chemical mechanical polishing (CMP) machines for semiconductor wafers use rotating pads and temperature-controlled slurries to achieve mirror-finish surfaces with atomic-level flatness required for lithography. Statistical note (a)(ii)(C) preparation equipment. Temperature process justifies HTS 8419.89.95.
Silicon Crystal Annealing Furnace
Rapid thermal annealing equipment for semiconductor crystals uses precisely controlled heating/cooling cycles to relieve stresses in silicon boules post-grinding, preventing wafer cracking. Temperature treatment process per Chapter 84. HTS 8419.89.95 for non-furnace specific semiconductor thermal equipment.
Wafer Cooling Station
Automated wafer cooling stations rapidly cool semiconductor wafers post-high-temperature processing using controlled inert gas or liquid nitrogen flows to prevent thermal shock and defects. Essential temperature change equipment in wafer fab. Classifies under HTS 8419.89.95 cooling apparatus.
Epitaxial Reactor Temperature Controller
Multi-zone temperature control systems for epitaxial reactors maintain precise gradients (e.g., 1000-1200°C) across susceptors during thin film deposition on semiconductor wafers. Critical for layer thickness uniformity. HTS 8419.89.95 for temperature treatment equipment.
Semiconductor Drying Oven
Cleanroom-compatible drying ovens for semiconductor wafers post-RCA cleaning use filtered hot air (80-150°C) with laminar flow to remove moisture without contamination. Statistical note temperature processing. HTS 8419.89.95 drying equipment.
Semiconductor Wafer Lapper
Semiconductor wafer lappers use abrasive slurries with temperature-controlled slurries to lap both sides of silicon wafers simultaneously, achieving critical flatness for device fabrication. Part of wafer preparation equipment in statistical note (a)(ii)(C). HTS 8419.89.95 covers the temperature-regulated lapping process.