Gallium Arsenide Wafer Grinder

Specialized grinder for back-thinning GaAs compound semiconductor wafers to device fabrication thicknesses with integrated cooling systems. Specifically HTS 8419.89.95.85 for 'other materials' (non-silicon) wafer preparation equipment.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China4.2%+35.0%39.2%
🇲🇽Mexico4.2%+10.0%14.2%
🇨🇦Canada4.2%+10.0%14.2%
🇩🇪Germany4.2%+10.0%14.2%
🇯🇵Japan4.2%+10.0%14.2%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8419.89.95Same rate: 39.2%

If adapted for silicon wafers instead

Silicon-specific wafer prep equipment has dedicated statistical breakout.

9018.90.75Lower: 35% vs 39.2%

If for compound semiconductor testing grinders

Certain testing apparatus for semiconductors in Chapter 90.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Explicitly declare GaAs/compound semiconductor use to qualify for 'other materials' subheading

Include material safety data for gallium compounds in shipping docs

Silicon versions use 8419.89.9580; ensure material specificity prevents misclassification

Related Products under HTS 8419.89.95.85

Float Zone Crystal Grower

Equipment employing the float zone method to produce high-purity monocrystalline semiconductor boules through localized melting and resolidification zones. Classified under HTS 8419.89.95.85 for its heating and cooling processes on 'other materials' like silicon or gallium arsenide in semiconductor production.

Wafer Lapping Machine

Equipment that lap semiconductor wafers to achieve precise flatness and thickness uniformity using abrasive slurries and temperature-controlled platens. Classified in HTS 8419.89.95.85 for wafer preparation involving material treatment by temperature change on other semiconductor materials.

Silicon Carbide Wafer Polishing Station

Temperature-controlled polishing station for SiC wafers used in power electronics, featuring high-temperature slurries and precise thermal management. Classified HTS 8419.89.95.85 as wafer prep for other semiconductor materials beyond silicon/GaAs.

RF Zone Refiner for Semiconductors

Radio frequency zone refining furnace for ultra-purification of semiconductor rod materials through repeated melting/solidification passes. Falls under HTS 8419.89.95.85 for temperature treatment equipment processing other semiconductor materials.

Edge Grinding Machine for Wafers

Automated edge profiling and grinding machine for semiconductor wafers to prevent chipping during handling, with coolant temperature regulation. HTS 8419.89.95.85 for wafer preparation cooling processes on other materials.

Double-Sided Wafer Lapper

Simultaneous double-sided lapping equipment for semiconductor wafers achieving sub-micron thickness uniformity through synchronized temperature-controlled platens. Classified under HTS 8419.89.95.85 for advanced wafer preparation on other materials.