CVD Quartz Reactor Liner
Fused silica quartz liner tube for chemical vapor deposition (CVD) reactors in semiconductor production. Protects furnace chamber from process gases while maintaining optical transparency for monitoring. HTS 7020.00.30.00 applies to its specialized design for wafer diffusion/oxidation.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If other quartz articles not specifically for diffusion/oxidation furnaces
7020.00.60 covers general quartzware; 7020.00.30 requires semiconductor furnace specificity
If imported as unwrought fused quartz rod before tube forming
Unworked fused quartz classifies in 7002; finished reactor shapes move to 7020
If when imported as integral furnace component with metallic elements
Complete semiconductor processing equipment parts go to 8419, not separate glass liners
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Import Tips & Compliance
• Certify OH content (<20 ppm) typical for CVD quartz to distinguish from general furnace tubes
• Avoid bulk packaging declarations; specify semiconductor cleanroom compatibility
• Document gas flow specifications to prove reactor tube function vs. generic tubing
Related Products under HTS 7020.00.30.00
Fused Quartz Diffusion Tube
A high-purity fused quartz tube designed for insertion into diffusion furnaces used in semiconductor wafer production. It withstands extreme temperatures and corrosive gases during the doping process. Classified under HTS 7020.00.30.00 as a specialized quartz article for semiconductor manufacturing equipment.
Quartz Oxidation Boat Holder
Precision-machined fused quartz holder for semiconductor wafer boats in oxidation furnaces. Enables uniform thermal distribution and chemical purity during oxide layer formation on wafers. Falls under HTS 7020.00.30.00 due to its design for specific semiconductor thermal processing.
Semiconductor Quartz Process Tube
High-temperature fused quartz process tube for diffusion and oxidation stages in silicon wafer fabrication. Features precise ID/OD tolerances for horizontal furnace insertion. Specifically classified in HTS 7020.00.30.00 for semiconductor manufacturing applications.
Fused Silica Wafer Boat Support
Fused silica holder designed to support multiple wafer boats within oxidation furnaces for semiconductor production. Provides thermal uniformity and contamination-free handling. HTS 7020.00.30.00 covers such specialized quartz furnace components.
Horizontal Diffusion Furnace Tube
Long fused quartz tube for horizontal diffusion furnaces used in semiconductor dopant diffusion processes. Engineered for gas flow dynamics and 1200°C+ operation. Precisely matches HTS 7020.00.30.00 description for semiconductor wafer production equipment.
Quartz LPCVD Reactor Tube
Specialized fused quartz tube for Low Pressure Chemical Vapor Deposition (LPCVD) reactors in semiconductor thin film deposition. Maintains vacuum integrity at elevated temperatures. Classifies under HTS 7020.00.30.00 for diffusion/oxidation furnace insertion.