Semiconductor Quartz Process Tube
High-temperature fused quartz process tube for diffusion and oxidation stages in silicon wafer fabrication. Features precise ID/OD tolerances for horizontal furnace insertion. Specifically classified in HTS 7020.00.30.00 for semiconductor manufacturing applications.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If made from common glass rather than fused quartz
Non-quartz glass tubes for tubes/pipes classify in 7013; requires fused silica per Chapter 70
If classified as semiconductor manufacturing machine part
Parts for wafer fabrication equipment may go to 8479 if not purely glass articles
If surface treated with non-transparent reflective coating
Coated glass articles with Chapter 70 note (c) layers may shift to prepared pigments heading
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Import Tips & Compliance
• Specify length/diameter matching standard furnace specs (e.g
• 150mm-200mm wafers)
• Include bubble-free certification; defects common cause for rejections at entry
• Reference SEMI standards (F14) in documentation for industry credibility
Related Products under HTS 7020.00.30.00
Fused Quartz Diffusion Tube
A high-purity fused quartz tube designed for insertion into diffusion furnaces used in semiconductor wafer production. It withstands extreme temperatures and corrosive gases during the doping process. Classified under HTS 7020.00.30.00 as a specialized quartz article for semiconductor manufacturing equipment.
Quartz Oxidation Boat Holder
Precision-machined fused quartz holder for semiconductor wafer boats in oxidation furnaces. Enables uniform thermal distribution and chemical purity during oxide layer formation on wafers. Falls under HTS 7020.00.30.00 due to its design for specific semiconductor thermal processing.
CVD Quartz Reactor Liner
Fused silica quartz liner tube for chemical vapor deposition (CVD) reactors in semiconductor production. Protects furnace chamber from process gases while maintaining optical transparency for monitoring. HTS 7020.00.30.00 applies to its specialized design for wafer diffusion/oxidation.
Fused Silica Wafer Boat Support
Fused silica holder designed to support multiple wafer boats within oxidation furnaces for semiconductor production. Provides thermal uniformity and contamination-free handling. HTS 7020.00.30.00 covers such specialized quartz furnace components.
Horizontal Diffusion Furnace Tube
Long fused quartz tube for horizontal diffusion furnaces used in semiconductor dopant diffusion processes. Engineered for gas flow dynamics and 1200°C+ operation. Precisely matches HTS 7020.00.30.00 description for semiconductor wafer production equipment.
Quartz LPCVD Reactor Tube
Specialized fused quartz tube for Low Pressure Chemical Vapor Deposition (LPCVD) reactors in semiconductor thin film deposition. Maintains vacuum integrity at elevated temperatures. Classifies under HTS 7020.00.30.00 for diffusion/oxidation furnace insertion.