Semiconductor Quartz Process Tube from Japan
High-temperature fused quartz process tube for diffusion and oxidation stages in silicon wafer fabrication. Features precise ID/OD tolerances for horizontal furnace insertion. Specifically classified in HTS 7020.00.30.00 for semiconductor manufacturing applications.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Specify length/diameter matching standard furnace specs (e.g
• 150mm-200mm wafers)
• Include bubble-free certification; defects common cause for rejections at entry
• Reference SEMI standards (F14) in documentation for industry credibility