Fused Quartz Diffusion Tube
A high-purity fused quartz tube designed for insertion into diffusion furnaces used in semiconductor wafer production. It withstands extreme temperatures and corrosive gases during the doping process. Classified under HTS 7020.00.30.00 as a specialized quartz article for semiconductor manufacturing equipment.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If made principally of sintered alumina ceramics instead of quartz
Refractory ceramic tubes for furnaces fall under heading 6903, not glass articles in 7020
If imported as complete furnace part or accessory
Parts of semiconductor diffusion furnaces are classified in 8419 with the machinery, not separately as glass
If constructed from laboratory borosilicate glass rather than fused quartz
Lab glassware tubes go to 7017, while semiconductor-specific quartz stays in specialized 7020.00.30
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Import Tips & Compliance
• Verify purity certification (SiO2 >99.99%) to confirm fused quartz classification per Chapter 70 notes
• Include technical specs and end-use statements proving semiconductor furnace application to avoid reclassification
• Ensure proper documentation of thermal shock resistance (>1000°C) as common CBP scrutiny point
Related Products under HTS 7020.00.30.00
Quartz Oxidation Boat Holder
Precision-machined fused quartz holder for semiconductor wafer boats in oxidation furnaces. Enables uniform thermal distribution and chemical purity during oxide layer formation on wafers. Falls under HTS 7020.00.30.00 due to its design for specific semiconductor thermal processing.
CVD Quartz Reactor Liner
Fused silica quartz liner tube for chemical vapor deposition (CVD) reactors in semiconductor production. Protects furnace chamber from process gases while maintaining optical transparency for monitoring. HTS 7020.00.30.00 applies to its specialized design for wafer diffusion/oxidation.
Semiconductor Quartz Process Tube
High-temperature fused quartz process tube for diffusion and oxidation stages in silicon wafer fabrication. Features precise ID/OD tolerances for horizontal furnace insertion. Specifically classified in HTS 7020.00.30.00 for semiconductor manufacturing applications.
Fused Silica Wafer Boat Support
Fused silica holder designed to support multiple wafer boats within oxidation furnaces for semiconductor production. Provides thermal uniformity and contamination-free handling. HTS 7020.00.30.00 covers such specialized quartz furnace components.
Horizontal Diffusion Furnace Tube
Long fused quartz tube for horizontal diffusion furnaces used in semiconductor dopant diffusion processes. Engineered for gas flow dynamics and 1200°C+ operation. Precisely matches HTS 7020.00.30.00 description for semiconductor wafer production equipment.
Quartz LPCVD Reactor Tube
Specialized fused quartz tube for Low Pressure Chemical Vapor Deposition (LPCVD) reactors in semiconductor thin film deposition. Maintains vacuum integrity at elevated temperatures. Classifies under HTS 7020.00.30.00 for diffusion/oxidation furnace insertion.