CVD Quartz Reactor Liner from Japan
Fused silica quartz liner tube for chemical vapor deposition (CVD) reactors in semiconductor production. Protects furnace chamber from process gases while maintaining optical transparency for monitoring. HTS 7020.00.30.00 applies to its specialized design for wafer diffusion/oxidation.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Certify OH content (<20 ppm) typical for CVD quartz to distinguish from general furnace tubes
• Avoid bulk packaging declarations; specify semiconductor cleanroom compatibility
• Document gas flow specifications to prove reactor tube function vs. generic tubing