Nitrogen-Doped Silicon Carbide Wafers

SiC wafers doped with nitrogen for high-power, high-temperature electronics like EV inverters and power supplies. Offers wide bandgap properties for efficient power conversion. HTS 3818.00.00.95 covers these doped compound wafers.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
πŸ‡¨πŸ‡³ChinaFree+50.0%50%
πŸ‡²πŸ‡½MexicoFreeβ€”Free
πŸ‡¨πŸ‡¦CanadaFreeβ€”Free
πŸ‡©πŸ‡ͺGermanyFreeβ€”Free
πŸ‡―πŸ‡΅JapanFreeβ€”Free

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

2849.20.10.00Lower: Free vs 50%

If pure silicon carbide without electronic doping

Undoped SiC classified as inorganic carbides, not doped electronics.

8541.10.00Same rate: 50%

If diodes fabricated from doped SiC

Processed into power diodes becomes semiconductor devices.

3824Lower: 15% vs 50%

If chemical vapor deposition precursors for doping

Doping gases/liquids are chemical preparations, not solid wafers.

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Import Tips & Compliance

β€’ Crystal orientation (4H/6H) and micropipe density certification mandatory for valuation

β€’ Handle as brittle material; thermal shock resistance data aids claims

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Double-Sided Polished Doped Silicon Wafers

Precision-polished silicon wafers doped on both sides for advanced sensors and MEMS fabrication. Ensures flatness for thin-film deposition in electronics. Covered by HTS 3818.00.00.95.

Boron-Doped Silicon Wafers

Thin discs of silicon intentionally doped with boron to create p-type semiconductors for use in electronics manufacturing. These wafers serve as the foundational substrate for integrated circuits, transistors, and solar cells. Classified under HTS 3818.00.00.95 as chemical compounds doped for electronics in wafer form.

Phosphorus-Doped N-Type Silicon Wafers

Silicon wafers doped with phosphorus atoms to achieve n-type conductivity, critical for fabricating diodes, MOSFETs, and photovoltaic cells in electronics. The doping alters electrical properties for semiconductor applications. Falls under HTS 3818.00.00.95 as other doped chemical compounds for electronics.

Arsenic-Doped Gallium Arsenide Wafers

Gallium arsenide substrates doped with arsenic or related impurities for high-frequency electronics like RF amplifiers and LEDs. These compound semiconductors offer superior electron mobility for optoelectronics. Covered by HTS 3818.00.00.95 for other doped chemicals in wafer form.

Antimony-Doped Silicon Wafer Substrates

Silicon discs doped with antimony for n-type semiconductors used in power electronics and sensors. Provides higher doping levels than phosphorus for specific high-current applications. HTS 3818.00.00.95 applies to these other doped electronic compounds.