Plasma Etching Reactor for TFT Panels
A reactive ion etching system that removes material from TFT layers on glass substrates using plasma in flat panel display production. This apparatus is solely for FPD manufacturing, ensuring precise patterning of thin-film transistors.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If the etching machine is used for general material removal not specific to FPD
Machine tools for working any material by removing material may fall under this heading.
If the reactor uses plasma processes for applications beyond FPD manufacturing
Electrical machines with individual functions may fall under other electrical apparatus.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Ensure the etching reactor is specifically for FPD substrates, not semiconductor wafers
• Provide technical data showing plasma uniformity and substrate handling
• Keep records of the reactor's use in TFT array production for CBSA verification
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