Plasma Etching Reactor for TFT Panels from United States
A reactive ion etching system that removes material from TFT layers on glass substrates using plasma in flat panel display production. It is a dedicated apparatus for FPD manufacturing, enabling precise patterning of thin-film transistors.
Duty Rate — United States → Canada
0%
PGA flags
No agency flag on this HTS number in the CBSA Single Window matching criteria.
CBSA Single Window matching criteria, unknown
Import Tips
• Confirm the reactor is designed for FPD glass substrates, not semiconductor wafers, to avoid classification under 8486.10.00
• Provide etch process details and substrate size
• Ensure compliance with Canadian regulations on plasma processing equipment