Plasma Etching Reactor for TFT Panels from Mexico
A reactive ion etching system that removes material from TFT layers on glass substrates using plasma in flat panel display production. It is a dedicated apparatus for FPD manufacturing, enabling precise patterning of thin-film transistors.
Duty Rate — Mexico → Canada
0%
Import Tips
• Confirm the reactor is designed for FPD glass substrates, not semiconductor wafers, to avoid classification under 8486.10.00
• Provide etch process details and substrate size
• Ensure compliance with Canadian regulations on plasma processing equipment