Plasma Etching Reactor for TFT Panels from Germany
A reactive ion etching system that removes material from TFT layers on glass substrates using plasma in flat panel display production. This apparatus is solely for FPD manufacturing, ensuring precise patterning of thin-film transistors.
Duty Rate — Germany → Canada
0%
Import Tips
• Ensure the etching reactor is specifically for FPD substrates, not semiconductor wafers
• Provide technical data showing plasma uniformity and substrate handling
• Keep records of the reactor's use in TFT array production for CBSA verification