Mask Pattern Generator Stage
Ultra-precise air-bearing XY stage for mask writers providing <2nm positioning accuracy. Critical component specifically for mask and reticle manufacturing machines under HTS 8486.40.0010.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If general semiconductor machine parts
Parts/accessories heading used when mask specificity insufficiently documented.
If parts of unspecified semiconductor machines
General parts provisions apply without clear mask manufacturing designation.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Include Abbe error correction specs and thermal stability data (<0.5ppm)
• Provide compatibility documentation for specific mask writing platforms
Related Products under HTS 8486.40.00.10
Electron Beam Mask Writer
A precision machine that uses electron beam lithography to directly write patterns onto photomask blanks for semiconductor reticles. It falls under HTS 8486.40.0010 as it is specifically used for the manufacture of masks and reticles in semiconductor production.
Mask Reticle Repair Workstation
Advanced system using focused ion beam (FIB) technology to repair defects in photomasks and reticles by milling and deposition. Qualifies for HTS 8486.40.0010 due to its specific application in mask and reticle repair for semiconductor fabrication.
Photomask Pellicle Inspection System
Automated inspection equipment for verifying pellicle mounting quality and particle contamination on photomasks. Falls under HTS 8486.40.0010 as essential apparatus for mask manufacturing and quality control.
Phase Shift Mask Writer
Specialized stepper that creates phase shift masks with precise thickness control for advanced lithography. Dedicated semiconductor mask manufacturing equipment under HTS 8486.40.0010.
Binary Mask Etching Equipment
Reactive ion etching system optimized for pattern transfer in binary photomask production. Essential mask manufacturing apparatus under HTS 8486.40.0010 statistical note.
Mask Alignment Verification System
Metrology tool measuring overlay accuracy and pattern placement on finished photomasks before litho use. Manufacturing quality control equipment for masks under HTS 8486.40.0010.