Mask Pattern Generator Stage from Mexico
Ultra-precise air-bearing XY stage for mask writers providing <2nm positioning accuracy. Critical component specifically for mask and reticle manufacturing machines under HTS 8486.40.0010.
Duty Rate — Mexico → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Include Abbe error correction specs and thermal stability data (<0.5ppm)
• Provide compatibility documentation for specific mask writing platforms