For the manufacture or repair of masks and reticles
Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in note 11(C) to this chapter; parts and accessories: > Machines and apparatus specified in note 11(C) to this chapter > For the manufacture or repair of masks and reticles
Duty Rate (from China)
Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Products classified under HTS 8486.40.00.10
Electron Beam Mask Writer
A precision machine that uses electron beam lithography to directly write patterns onto photomask blanks for semiconductor reticles. It falls under HTS 8486.40.0010 as it is specifically used for the manufacture of masks and reticles in semiconductor production.
Mask Reticle Repair Workstation
Advanced system using focused ion beam (FIB) technology to repair defects in photomasks and reticles by milling and deposition. Qualifies for HTS 8486.40.0010 due to its specific application in mask and reticle repair for semiconductor fabrication.
Photomask Pellicle Inspection System
Automated inspection equipment for verifying pellicle mounting quality and particle contamination on photomasks. Falls under HTS 8486.40.0010 as essential apparatus for mask manufacturing and quality control.
Phase Shift Mask Writer
Specialized stepper that creates phase shift masks with precise thickness control for advanced lithography. Dedicated semiconductor mask manufacturing equipment under HTS 8486.40.0010.
Binary Mask Etching Equipment
Reactive ion etching system optimized for pattern transfer in binary photomask production. Essential mask manufacturing apparatus under HTS 8486.40.0010 statistical note.
Mask Alignment Verification System
Metrology tool measuring overlay accuracy and pattern placement on finished photomasks before litho use. Manufacturing quality control equipment for masks under HTS 8486.40.0010.
Reticles Chrome Deposition Chamber
Sputtering system depositing uniform chrome thin films on quartz substrates for photomask blanks. Front-end mask manufacturing equipment qualifying for HTS 8486.40.0010.
OPC Mask Verification Station
Automated station verifying optical proximity correction patterns on advanced photomasks using AIMS simulation. Critical mask manufacturing validation tool under HTS 8486.40.0010.
E-Beam Mask Inspection System
High-resolution electron beam inspection detecting sub-20nm defects on patterned photomasks. Essential semiconductor mask manufacturing quality control under HTS 8486.40.0010.
Reticles Handling Automation System
Robotic SMIF-compatible pod handling system for clean transfer of photomasks between manufacturing tools. Essential apparatus for mask manufacturing workflow under HTS 8486.40.0010.
Laser Pattern Generator for Reticles
High-precision laser-based system that generates intricate patterns on chrome-on-glass reticles used in photolithography. Classified under HTS 8486.40.0010 for its dedicated role in semiconductor mask and reticle manufacturing.
Reticles Mask Cleaning Station
Automated wet and megasonic cleaning system designed specifically for cleaning photomasks and reticles without pattern damage. Classified in HTS 8486.40.0010 for mask manufacturing preparation processes.
EUV Mask Blank Inspection Tool
Deep ultraviolet inspection system for detecting defects in extreme ultraviolet (EUV) mask blanks before patterning. HTS 8486.40.0010 classification due to role in advanced semiconductor mask manufacturing.
Reticles Defect Repair Laser System
Laser-based repair station that removes chrome defects and deposits material on reticles using femtosecond pulses. Specific to mask and reticle repair qualifying for HTS 8486.40.0010.
Mask Pattern Generator Stage
Ultra-precise air-bearing XY stage for mask writers providing <2nm positioning accuracy. Critical component specifically for mask and reticle manufacturing machines under HTS 8486.40.0010.