Laser Pattern Generator for Reticles
High-precision laser-based system that generates intricate patterns on chrome-on-glass reticles used in photolithography. Classified under HTS 8486.40.0010 for its dedicated role in semiconductor mask and reticle manufacturing.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If for flat panel display mask production
Similar equipment for FPD masks falls under separate statistical suffix within same heading.
If configured for general photomechanical plate making
Chapter 84 provisions for printing machinery may apply to non-semiconductor pattern generators.
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Import Tips & Compliance
• Provide laser wavelength specs and pattern resolution data to distinguish from general laser systems
• Ensure end-user declarations specify mask/reticle production to prevent reclassification
Related Products under HTS 8486.40.00.10
Electron Beam Mask Writer
A precision machine that uses electron beam lithography to directly write patterns onto photomask blanks for semiconductor reticles. It falls under HTS 8486.40.0010 as it is specifically used for the manufacture of masks and reticles in semiconductor production.
Mask Reticle Repair Workstation
Advanced system using focused ion beam (FIB) technology to repair defects in photomasks and reticles by milling and deposition. Qualifies for HTS 8486.40.0010 due to its specific application in mask and reticle repair for semiconductor fabrication.
Photomask Pellicle Inspection System
Automated inspection equipment for verifying pellicle mounting quality and particle contamination on photomasks. Falls under HTS 8486.40.0010 as essential apparatus for mask manufacturing and quality control.
Phase Shift Mask Writer
Specialized stepper that creates phase shift masks with precise thickness control for advanced lithography. Dedicated semiconductor mask manufacturing equipment under HTS 8486.40.0010.
Binary Mask Etching Equipment
Reactive ion etching system optimized for pattern transfer in binary photomask production. Essential mask manufacturing apparatus under HTS 8486.40.0010 statistical note.
Mask Alignment Verification System
Metrology tool measuring overlay accuracy and pattern placement on finished photomasks before litho use. Manufacturing quality control equipment for masks under HTS 8486.40.0010.