Laser Pattern Generator for Reticles from China
High-precision laser-based system that generates intricate patterns on chrome-on-glass reticles used in photolithography. Classified under HTS 8486.40.0010 for its dedicated role in semiconductor mask and reticle manufacturing.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Provide laser wavelength specs and pattern resolution data to distinguish from general laser systems
• Ensure end-user declarations specify mask/reticle production to prevent reclassification