Phase Shift Mask Writer
Specialized stepper that creates phase shift masks with precise thickness control for advanced lithography. Dedicated semiconductor mask manufacturing equipment under HTS 8486.40.0010.
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Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If for semiconductor boule production
Different semiconductor manufacturing stages have separate headings.
If primarily photographic apparatus
Chapter 90 photographic equipment may apply to non-manufacturing pattern generators.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Document phase shifting layer deposition specifications and overlay accuracy
• Include mask format compatibility (6-inch, 8-inch quartz substrates)
• Prevent misclassification as wafer stepper by proving mask-only functionality
Related Products under HTS 8486.40.00.10
Electron Beam Mask Writer
A precision machine that uses electron beam lithography to directly write patterns onto photomask blanks for semiconductor reticles. It falls under HTS 8486.40.0010 as it is specifically used for the manufacture of masks and reticles in semiconductor production.
Mask Reticle Repair Workstation
Advanced system using focused ion beam (FIB) technology to repair defects in photomasks and reticles by milling and deposition. Qualifies for HTS 8486.40.0010 due to its specific application in mask and reticle repair for semiconductor fabrication.
Photomask Pellicle Inspection System
Automated inspection equipment for verifying pellicle mounting quality and particle contamination on photomasks. Falls under HTS 8486.40.0010 as essential apparatus for mask manufacturing and quality control.
Binary Mask Etching Equipment
Reactive ion etching system optimized for pattern transfer in binary photomask production. Essential mask manufacturing apparatus under HTS 8486.40.0010 statistical note.
Mask Alignment Verification System
Metrology tool measuring overlay accuracy and pattern placement on finished photomasks before litho use. Manufacturing quality control equipment for masks under HTS 8486.40.0010.
Reticles Chrome Deposition Chamber
Sputtering system depositing uniform chrome thin films on quartz substrates for photomask blanks. Front-end mask manufacturing equipment qualifying for HTS 8486.40.0010.