Phase Shift Mask Writer from Japan
Specialized stepper that creates phase shift masks with precise thickness control for advanced lithography. Dedicated semiconductor mask manufacturing equipment under HTS 8486.40.0010.
Duty Rate — Japan → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Document phase shifting layer deposition specifications and overlay accuracy
• Include mask format compatibility (6-inch, 8-inch quartz substrates)
• Prevent misclassification as wafer stepper by proving mask-only functionality