Electron Beam Mask Writer
A precision machine that uses electron beam lithography to directly write patterns onto photomask blanks for semiconductor reticles. It falls under HTS 8486.40.0010 as it is specifically used for the manufacture of masks and reticles in semiconductor production.
Import Duty Rates by Country of Origin
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If used for direct wafer patterning rather than masks
Direct wafer exposure machines fall under machines for semiconductor device manufacture, not specifically mask/reticle equipment.
If classified primarily as optical inspection equipment
Other microscopes and diffraction apparatus in Chapter 90 may apply if primary function is inspection rather than mask writing.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right HTS code — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Verify equipment is solely for mask/reticle production with manufacturer specs to confirm HTS classification
• Include detailed technical documentation proving semiconductor boule/wafer manufacturing use for customs clearance
• Avoid misclassification as general lithography equipment by providing statistical note evidence
Related Products under HTS 8486.40.00.10
Mask Reticle Repair Workstation
Advanced system using focused ion beam (FIB) technology to repair defects in photomasks and reticles by milling and deposition. Qualifies for HTS 8486.40.0010 due to its specific application in mask and reticle repair for semiconductor fabrication.
Photomask Pellicle Inspection System
Automated inspection equipment for verifying pellicle mounting quality and particle contamination on photomasks. Falls under HTS 8486.40.0010 as essential apparatus for mask manufacturing and quality control.
Phase Shift Mask Writer
Specialized stepper that creates phase shift masks with precise thickness control for advanced lithography. Dedicated semiconductor mask manufacturing equipment under HTS 8486.40.0010.
Binary Mask Etching Equipment
Reactive ion etching system optimized for pattern transfer in binary photomask production. Essential mask manufacturing apparatus under HTS 8486.40.0010 statistical note.
Mask Alignment Verification System
Metrology tool measuring overlay accuracy and pattern placement on finished photomasks before litho use. Manufacturing quality control equipment for masks under HTS 8486.40.0010.
Reticles Chrome Deposition Chamber
Sputtering system depositing uniform chrome thin films on quartz substrates for photomask blanks. Front-end mask manufacturing equipment qualifying for HTS 8486.40.0010.