8486.40.00.10/Electron Beam Mask Writer/China

Electron Beam Mask Writer from China

A precision machine that uses electron beam lithography to directly write patterns onto photomask blanks for semiconductor reticles. It falls under HTS 8486.40.0010 as it is specifically used for the manufacture of masks and reticles in semiconductor production.

Duty Rate — China → United States

25%

Rate breakdown

9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
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Import Tips

• Verify equipment is solely for mask/reticle production with manufacturer specs to confirm HTS classification

• Include detailed technical documentation proving semiconductor boule/wafer manufacturing use for customs clearance

• Avoid misclassification as general lithography equipment by providing statistical note evidence

Electron Beam Mask Writer from China — Import Duty Rate | HTS 8486.40.00.10