Wafer Lapping Machine

Equipment that lap semiconductor wafers to precise thickness and flatness using abrasive slurries. Falls under HTS 8479.90.95 per statistical note for wafer preparation apparatus. Critical for achieving total thickness variation (TTV) specifications.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
πŸ‡¨πŸ‡³ChinaFree+35.0%35%
πŸ‡²πŸ‡½MexicoFree+10.0%10%
πŸ‡¨πŸ‡¦CanadaFree+10.0%10%
πŸ‡©πŸ‡ͺGermanyFree+10.0%10%
πŸ‡―πŸ‡΅JapanFree+10.0%10%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8460.39.00Higher: 39.4% vs 35%

If general purpose lapping/polishing machines

Without semiconductor specification, classifies under Chapter 84 machine tools.

8421.19.00.00Higher: 36.3% vs 35%

If considered centrifugal cleaning equipment

Post-lap cleaning function might dominate classification.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

β€’ Include slurry composition and platen rotation specs in technical documentation

β€’ Certify machine achieves TTV <1ΞΌm, distinguishing from general polishers

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