Semiconductor Wafer Lapper

Electromechanical lapping machine with self-contained motor that uses loose abrasive slurry on cast iron plates to achieve sub-micron flatness on semiconductor wafer surfaces prior to polishing. Critical for bringing wafers within tight dimensional tolerances. HTS 8479.89.65.00 for wafer preparation equipment.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China2.8%+17.5%20.3%
🇲🇽Mexico2.8%+10.0%12.8%
🇨🇦Canada2.8%+10.0%12.8%
🇩🇪Germany2.8%+10.0%12.8%
🇯🇵Japan2.8%+10.0%12.8%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8460.90.40Higher: 39.4% vs 20.3%

If

8421.19.00.00Higher: 36.3% vs 20.3%

If

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Import Tips & Compliance

Include flatness specification data (bow/warp <1μm) confirming semiconductor use

Classify slurry pumps separately if modular to avoid integral machine valuation

Certify lapping plates meet semiconductor contamination standards (ultra-pure cast iron)

Related Products under HTS 8479.89.65.00

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