Semiconductor Wafer Lapper from Mexico
Electromechanical lapping machine with self-contained motor that uses loose abrasive slurry on cast iron plates to achieve sub-micron flatness on semiconductor wafer surfaces prior to polishing. Critical for bringing wafers within tight dimensional tolerances. HTS 8479.89.65.00 for wafer preparation equipment.
Duty Rate — Mexico → United States
12.8%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include flatness specification data (bow/warp <1μm) confirming semiconductor use
• Classify slurry pumps separately if modular to avoid integral machine valuation
• Certify lapping plates meet semiconductor contamination standards (ultra-pure cast iron)