Double-Sided Wafer Polisher

Equipment polishing both sides of semiconductor wafers simultaneously using chemical-mechanical planarization (CMP) pads. Fits HTS 8431.39.0080 as other parts of heading 8428 polishers for wafer prep. Achieves mirror finish for device fabrication.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+35.0%35%
🇲🇽MexicoFree+10.0%10%
🇨🇦CanadaFree+10.0%10%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+10.0%10%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8430.50.50.00Same rate: 35%

If for glass or ceramic polishing

Similar polishers for non-semiconductor substrates fall under other machinery.

8421.19.00.00Higher: 36.3% vs 35%

If centrifugal polishing apparatus

Spin-based polishers primarily for liquids classify in filtering machinery.

9031.80.80Same rate: 35%

If with integrated measuring

Polishers combining surface metrology are Chapter 90 measuring machines.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Include CMP slurry flow data and pad pressure specs for customs review

Avoid misclass as consumer polishers (8439)

Validate cleanroom class 1 compatibility

Related Products under HTS 8431.39.00.80

Wafer Thickness Gauging Fixture

Mechanical fixture integrating with grinders to monitor wafer thickness in-situ during backgrinding. Part of HTS 8431.39.0080 for 8428 wafer grinders. Maintains target thickness to ±1 micron.

Czochralski Crystal Puller Furnace

A high-temperature furnace used in semiconductor manufacturing to grow monocrystalline silicon boules via the Czochralski method. It is a part specifically designed for crystal growers and pullers under heading 8428, fitting HTS 8431.39.0080 as other parts of semiconductor wafer manufacturing equipment. Essential for producing pure semiconductor crystals from which wafers are sliced.

Float Zone Crystal Growth Apparatus

Specialized equipment for float zone method to produce high-purity monocrystalline semiconductor boules without crucibles. Designed as a key component for wafer manufacturing machinery of heading 8428, classified under HTS 8431.39.0080. Critical for oxygen-free silicon crystals used in advanced semiconductors.

Semiconductor Crystal Grinder

Precision grinder for shaping crystal boules to exact wafer diameters and grinding flats indicating conductivity type. Falls under HTS 8431.39.0080 as other parts of heading 8428 wafer preparation equipment per statistical notes. Ensures precise geometry for subsequent wafer slicing.

Wafer Slicing Diamond Saw

High-precision diamond wire or blade saw for slicing ultra-thin wafers from monocrystalline semiconductor boules. Classified in HTS 8431.39.0080 as part of heading 8428 wafer preparation machinery. Maintains crystal integrity during high-volume wafer production.

Semiconductor Wafer Lapper

Lapping machine that uses loose abrasives to flatten semiconductor wafers to nanometer tolerances post-slicing. HTS 8431.39.0080 covers it as other wafer preparation parts for 8428 machinery per chapter notes. Prepares wafer surface for final polishing and fabrication.