Double-Sided Wafer Polisher from Japan
Equipment polishing both sides of semiconductor wafers simultaneously using chemical-mechanical planarization (CMP) pads. Fits HTS 8431.39.0080 as other parts of heading 8428 polishers for wafer prep. Achieves mirror finish for device fabrication.
Duty Rate — Japan → United States
15%
Rate breakdown
9903.82.1015%Except as provided for in headings 9903.82.12, 9903.82.17 and 9903.85.68, derivative aluminum and steel articles with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 15 percent, as provided for in subdivision (f) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Include CMP slurry flow data and pad pressure specs for customs review
• Avoid misclass as consumer polishers (8439)
• Validate cleanroom class 1 compatibility