CMP Polishing Pad Conditioner

Diamond disk conditioner that dresses CMP pads between wafer polishing runs. HTS 8431.39.0080 as part for 8428 wafer polishers. Maintains pad planarity for consistent removal rates.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+35.0%35%
🇲🇽MexicoFree+10.0%10%
🇨🇦CanadaFree+10.0%10%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+10.0%10%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

6804.21.00Same rate: 35%

If industrial diamond disks

Conditioning disks without mounting classify as millstones/abrasives.

8438.80.00.00Same rate: 35%

If auxiliary machinery parts

Pad dressers for non-semiconductor polishers fall under other machinery.

8202.39.00Same rate: 35%

If band saw blades equivalent

Similar diamond tools for saws are Chapter 82 saw blades.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Include diamond grit size (70-120 micron) and dresser pattern specs

Pitfall: abrasives under 6804

Track pad life data for valuation

Related Products under HTS 8431.39.00.80

Wafer Thickness Gauging Fixture

Mechanical fixture integrating with grinders to monitor wafer thickness in-situ during backgrinding. Part of HTS 8431.39.0080 for 8428 wafer grinders. Maintains target thickness to ±1 micron.

Czochralski Crystal Puller Furnace

A high-temperature furnace used in semiconductor manufacturing to grow monocrystalline silicon boules via the Czochralski method. It is a part specifically designed for crystal growers and pullers under heading 8428, fitting HTS 8431.39.0080 as other parts of semiconductor wafer manufacturing equipment. Essential for producing pure semiconductor crystals from which wafers are sliced.

Float Zone Crystal Growth Apparatus

Specialized equipment for float zone method to produce high-purity monocrystalline semiconductor boules without crucibles. Designed as a key component for wafer manufacturing machinery of heading 8428, classified under HTS 8431.39.0080. Critical for oxygen-free silicon crystals used in advanced semiconductors.

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Precision grinder for shaping crystal boules to exact wafer diameters and grinding flats indicating conductivity type. Falls under HTS 8431.39.0080 as other parts of heading 8428 wafer preparation equipment per statistical notes. Ensures precise geometry for subsequent wafer slicing.

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High-precision diamond wire or blade saw for slicing ultra-thin wafers from monocrystalline semiconductor boules. Classified in HTS 8431.39.0080 as part of heading 8428 wafer preparation machinery. Maintains crystal integrity during high-volume wafer production.

Semiconductor Wafer Lapper

Lapping machine that uses loose abrasives to flatten semiconductor wafers to nanometer tolerances post-slicing. HTS 8431.39.0080 covers it as other wafer preparation parts for 8428 machinery per chapter notes. Prepares wafer surface for final polishing and fabrication.