CMP Polishing Pad Conditioner from Canada

Diamond disk conditioner that dresses CMP pads between wafer polishing runs. HTS 8431.39.0080 as part for 8428 wafer polishers. Maintains pad planarity for consistent removal rates.

Duty Rate — Canada → United States

10%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter

Import Tips

Include diamond grit size (70-120 micron) and dresser pattern specs

Pitfall: abrasives under 6804

Track pad life data for valuation