Edwards EDP1200 Dry Rotary Pump

A 16 kW stationary dry rotary pump for semiconductor wafer lapping and polishing stations, providing contaminant-free vacuum. It matches HTS 8414.80.1665 as a rotary stationary air/vacuum pump in the specified power range for cleanroom semiconductor prep equipment.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳ChinaFree+35.0%35%
🇲🇽MexicoFree+10.0%10%
🇨🇦CanadaFree+10.0%10%
🇩🇪GermanyFree+10.0%10%
🇯🇵JapanFree+10.0%10%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8414.80Same rate: 35%

If turbo-molecular or diffusion type

High-vacuum turbo pumps for semiconductors classify under different 'other' air/vacuum provisions.

8481.80.90Higher: 37% vs 35%

If treated as valve-regulating pump assembly

Integrated regulator-pump sets may shift to taps/valves if primary function changes.

8479.82.00Same rate: 35%

If for wafer slicing saw coolant/compression systems

Machines mixing/compressing refrigerants for semiconductor wafer saws classify as complete processing machines.

Not sure which classification is right?

Our AI classifier can analyze your specific product and recommend the correct HTS code with confidence.

Import Tips & Compliance

Include material compatibility certs (e.g

PTFE components) for semiconductor chemical resistance

Declare as 'hermetic' if gas-tight for biological safety integrations in wafer fabs

Avoid reclassification by documenting exclusion of fan hood functions