Edwards EDP1200 Dry Rotary Pump from Japan
A 16 kW stationary dry rotary pump for semiconductor wafer lapping and polishing stations, providing contaminant-free vacuum. It matches HTS 8414.80.1665 as a rotary stationary air/vacuum pump in the specified power range for cleanroom semiconductor prep equipment.
Duty Rate — Japan → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) of U.S. note 16 to this subchapter
9903.03.060%Articles of aluminum, of steel, or of copper or derivative aluminum or steel articles; passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; parts of passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; medium- and heavy-duty vehicles; parts of medium- and heavy-duty vehicles; wood products; and semiconductor articles, of any country, as provided in subdivision (aa)(v) of U.S. note 2 to this subchapter
Import Tips
• Include material compatibility certs (e.g
• PTFE components) for semiconductor chemical resistance
• Declare as 'hermetic' if gas-tight for biological safety integrations in wafer fabs
• Avoid reclassification by documenting exclusion of fan hood functions